JPH0556645B2 - - Google Patents

Info

Publication number
JPH0556645B2
JPH0556645B2 JP59079507A JP7950784A JPH0556645B2 JP H0556645 B2 JPH0556645 B2 JP H0556645B2 JP 59079507 A JP59079507 A JP 59079507A JP 7950784 A JP7950784 A JP 7950784A JP H0556645 B2 JPH0556645 B2 JP H0556645B2
Authority
JP
Japan
Prior art keywords
mask
exposure
semiconductor substrate
alignment
alignment method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59079507A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60224224A (ja
Inventor
Katsumi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP59079507A priority Critical patent/JPS60224224A/ja
Publication of JPS60224224A publication Critical patent/JPS60224224A/ja
Publication of JPH0556645B2 publication Critical patent/JPH0556645B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59079507A 1984-04-20 1984-04-20 マスクアライメント方法 Granted JPS60224224A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59079507A JPS60224224A (ja) 1984-04-20 1984-04-20 マスクアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59079507A JPS60224224A (ja) 1984-04-20 1984-04-20 マスクアライメント方法

Publications (2)

Publication Number Publication Date
JPS60224224A JPS60224224A (ja) 1985-11-08
JPH0556645B2 true JPH0556645B2 (en]) 1993-08-20

Family

ID=13691855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59079507A Granted JPS60224224A (ja) 1984-04-20 1984-04-20 マスクアライメント方法

Country Status (1)

Country Link
JP (1) JPS60224224A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166026A (ja) * 1984-12-19 1986-07-26 Fujitsu Ltd 位置合わせ方法
US5451261A (en) * 1992-09-11 1995-09-19 Matsushita Electric Industrial Co., Ltd. Metal film deposition apparatus and metal film deposition method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2388371A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Procede d'alignement, dans un photorepeteur, d'une plaquette semi-conductrice et des motifs a y projeter et photorepeteur mettant en oeuvre un tel procede

Also Published As

Publication number Publication date
JPS60224224A (ja) 1985-11-08

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